X-ray Optical Systems

Combination of multilayer X-ray optics among each other or of multilayer X-ray optics with other types of X-ray optics to produce one- and two-dimensional collimated, focussed, compressed or expanded monochromatic X-ray beams. Applications in X-ray diffraction, X-ray reflectometry, X-ray tomography and synchrotron applications.

Twin Mirror Arrangement

Upgrades available for Cr Kα, Co Kα, Cu Kα, Mo Kα, Ag Kα radiation

Geometries on customers request

Twin Mirror Arrangement consisting of primary mirror with housing (left) and secondary mirror with housing, beam tube and detector slit holder (right)

Setup of Twin Mirror Arrangement (TMA)

A new quality in in-house X-ray reflectometry

Special features

  • Easy and fast sample alignment
  • Sample alignment within 10 seconds
  • Dynamic range of more than 7 orders of magnitude (cross intensity I > 3 · 109 cps)
  • No influence of sample displacement errors up to 200 µm on peak position and intensity
  • Low divergence (Cu Kα : Δφ < 0.03°)
  • Detectable thin film thicknesses between 2 nm and 270 nm 

X-ray reflectometry: Independence of peak intensities and angular positions at three different stage heights.

A new quality in X-ray diffractometry - secondary parallel beam optics

  • Increased S/N-ratio due to sample fluorescence suppression
  • Transmission higher than 60%
  • Fits best to primary parallel beam optics
  • Parallel beam geometry:
    • simplified sample preparation
    • increased accuracy

Better resolution than soller slits because of a more than two times lower angular acceptance (Cu Kα: Δφ < 0.03°)

Superior Kb suppression (I Cu Kα1 : I Cu Kβ1 > 1.000.000 : 1 (θ – 2θ – scan at Si (400) wafer))

Powder diffraction measurements in the angular range of the quartz triplet in parallel beam geometry (TMA) (a) and BRAGG-BRENTANO geometry (b)

 

Beam Compressor

Special features

  • Combination of a focusing and a convex bent collimating multilayer optics
  • Adjustable beam width b at sample position
  • Emission of a compressed parallel sub-millimeter beam
  • Generation of a monochromatic (Kα1+2)
  • parallel spot with a width
  • 0.25 mm < b' < 1.0 mm 

Application:
sub-millimeter X-ray-reflectometry

Ni/C gradient multilayer:
direction of period thickness gradient (X)
perpendicular to beam direction (Y)
spot size of the compressed Cu Kα1,2
2 -X-ray beam (Z x X) 0.3 mm x 0.6 mm

Reflectometry result:
No remarkable peak broadening at high peak intensities

1-dimensional compressed parallel beam

Beam path and main parameters of a beam compressor

Cu Kα-reflectance of a Ni/C graded multilayer at d = 3.66 nm (gradient Δd/Δx = 2 x 10-8), measured in Y-direction perpendicular to gradient of period thickness

Collimating Monochromator

Special features

  • Two parallel beam optics, aligned on the same focal point
  • Acceptance of parallel X-radiation emitted by a point focus X-ray source (e.g. 0.3 mm x 0.3 mm rotating Mo anode)
  • Generation of monochromatic (Kα1,2) parallel spot
  • Beam divergence in dispersion direction Δϕ < 0.03°
  • Divergence perpendicular to the dispersion direction Δϕ < 0.1°, tunable by means of slits 
     

Collimating Monochromator: generation of a 1- or 2-dimensional parallel beam

Beam path and main parameters of a collimating monochromator

Application: Powder Diffractometry

Sample: Si-powder (capillary)

Si (220) reflex, separation of Kα2 (left) and Kα2 (right)

Resolution (Divergence) in dispersion direction of the multilayer optics (A) and by slits (B)