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Thin Film XRF Reference Samples
X-ray fluorescence
reference sample with up
to 7 different elements on
a silicon nitride membrane
(above), PEEK sample
holder (below).
Energy spectra of three 7-element reference samples. The energy range from ~2 keV to ~40 keV is covered with peaks of comparable intensity.
Mass deposition of the elements on the
reference sample with corresponding
fluorescence emission line energies.
Advantages of Thin Film XRF reference samples:
• Absorption free standard: no matrix
correction necessary
• Substrate thickness of 100 nm / 200 nm permits
transmission measurements and leads to low
background from the substrate
• Mass depositions in the range of ng/mm²
(1-3 atomic layers) permit quantification
without the need to interpolate from
higher values
• Uncertainty ≤ 1 ng/mm² (1 atomic layer)
• Wide selection of non-overlapping XRF
lines, exact calibration curve with many
points over a large energy range
• Signal strength easily adjustable by
thickness, similar intensity for all elements
• High degree of uniformity & homogeneity
(better than 1% for the full sample area)
• Application for adjustment of confocal
μ-XRF possible
•Wide range of available elements
(standard and tailored compilations)
Lateral homegeneity measured by XRF μ-beam
mapping (1.2x1.2 mm² with 2.8x12 μm² beam)
of La and Cu, and XRF large area mapping
(15x15 mm² with 0.8x0.4 mm² beam) of La and
Cu (from left to right)