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The teaching tool for X-ray reflectometry consists of three typical samples:
a silicon substrate, a thin Ni single layer and a 10-period Ni/C-multilayer. The specular reflected intensity is measured as a function of grazing incident angle. Each measurement shows a characteristic pattern. Basic principles of total external reflexion and the interference of reflected and diffracted X-rays in a layer stack can be discussed. Layer thicknesses and interface roughnesses are determined by selected simulation programs.
Therefore the set contains an introduction into X-ray reflectometry on CD-ROM.
The thin films are deposited on flat Si-substrates (length L = 40 mm, width B = 20 mm) by means of Pulsed Laser Deposition (PLD) which are fixed on metallic holders (L x B x H = 40 x 20 x 10 mm3)
Teaching tool for X-ray reflectometry: pure silicon substrate, Ni single layer, 10 period Ni/C-multilayer
Concept of sample selection:
one interface bulk material / air
single layer with two interfaces
multilayer system with many interfaces
Application
for training and further education of students, scientists, skilled workers, ...
Determination of morphological parameters: layer thickness, material density, surface and interface roughness
More information:
Dresden University of Technology (TUD),
Institute of Structural Physics,
Prof. Dirk C. Meyer