 |
 |
 |
||||||||||||||
 |
||||||||||||||||
 |
||||||||||||||||
 |
 |
 |
 |
 |
 |
 |
 |
 |
 |
|||||||
 |
 |
|||||||||||||||
 |
||||||||||||||||
 |
 |
|||||||||||||||
 |
||||||||||||||||
 |
 |
|||||||||||||||
 |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
High Precision Deposition
High precision large area Pulsed Laser Deposition (PLD) and magnetron sputter deposition techniques are installed to deposit nanometer single and multilayers showing X-ray optical quality.
Across a stack of more than 500 layers with single layer thicknesses in the range between 1 to 10 nm a variation of single layer thickness considerably lower than sD = 0.1 nm and an interface roughness below
sR = 0.25 nm is realized. Thickness homogeneity
Dd/d < 1 % and lateral thickness gradients
Dd/Dx in the range of 10-8 are guaranteed across macroscopic substrate dimensions.
The deposition can be carried out on rectangular substrates and on substrates up to 6 inch diameter (LA-PLD).
These high precision layers are applied as mirrors for total reflection, for high precision reference samples and as samples for teaching, testing and demonstration of the performance of X-ray instrumentation.
High Precision Deposition